Hibridas Photosensitive Paste UV Exposure Unit MA-4K

Hibridas Photosensitive Paste UV Exposure Unit MA-4K

The machine is designed for UV exposure of printed and dried layers of photoimageable thick film pastes through a photo mask to achieve very fine line and high resolution patterns on ceramic substrates and LTCC tapes.

Technical Specifications

  • High intensity UV LED array in lamp head which scans the substrate/photo mask.
  • Exposure time, scan speed and lamp intensity control settings.
  • Substrate holders (vacuum) for substrate sizes up to 4 inch x 4 inch.
  • Photo mask frames for glass mask sizes up to 5 inch x 5inch.
  • Adjustable contact pressure between substrate and mask to ensure ‘hard’ contact.
  • Plastic film mask capability.
  • CCD camera vision/alignment system as option.